Ultra-High Purity High Flow Pressure Regulator PRH

The PRH Series Ultra-High Purity High Flow Pressure Regulator is designed with a single-stage diaphragm and hard-seal construction, ensuring ultra-low leak rates and high flow capacity. Its internal surfaces are electropolished (EP) to achieve ultra-low roughness, making it ideal for high-purity gas applications in the semiconductor industry. The regulator supports high-pressure input (up to 3500 psi) and delivers precise low-pressure output with high flow rates. Each unit undergoes rigorous pressure testing, helium mass spectrometry leak testing, and particle testing before delivery.

Materials

• Body: SS316L, SS316L VAR, Hastelloy C-22

• Seat: PCTFE, PI

• Diaphragm and Poppet: Hastelloy C-22, SS316L

Operating Temperature

• PCTFE: -40°C to 80°C

• PI: -26°C to 177°C

Leak Rates

• Internal Leak Rate: ≤ 2.0 x 10⁻¹⁰ Pa·m³/sec He

• External Leak Rate: ≤ 2.0 x 10⁻⁹ Pa·m³/sec He

• Seat Leak Rate: ≤ 4.0 x 10⁻⁸ Pa·m³/sec He

Internal Surface Roughness

• BA Grade: Ra ≤ 10 µin (0.25 µm)

• EP Grade: Ra ≤ 5 µin (0.13 µm)

Installation Options

• Rear-mount installation

• Panel-mount installation

Pressure Specifications

Maximum Inlet Pressure:

• Standard & High Flow (HF): 1700 psi (117 bar)

• Force Balanced (FC): 300 psig (21 bar)

• High Pressure (HR): 3500 psi (241 bar)

• Outlet Pressure: 1–150 psi (refer to selection table for details)

• Proof Pressure: 150% of working pressure

• Burst Pressure: 300% of working pressure

Specifications

• Sizes: 1/4”, 3/8”, 1/2”, 3/4”

• CV Value (Flow Coefficient):

• Force Balanced (FC): 0.65

• Standard: 0.9

• High Flow (HF): 0.15

• Internal Volume: 1.07 in³ (17.6 cm³)

• Supply Pressure Effect:

• Standard: 3.5%

• High Flow (HF) & Force Balanced (FC): 4.2% 

Applications

• High-purity gas delivery in semiconductor manufacturing

• Specialty gas systems in solar, nuclear, and LED industries

• Analytical instrumentation and laboratory systems